Product Overview

CVD chemical vapor deposition furnace is an important equipment for preparing carbon-carbon composite materials and completing the CVD gas phase deposition process.

Technical Parameters

1) Design temperature: 1250℃/1650℃/1800℃/2200℃

2) Commonly used temperature: 900~1200℃

3) Vacuum degree: <50Pa

4) Pressure rise rate: 6.67Pa/h (or 150Pa/24h) for empty furnace in cold state

5) Heating method: Graphite resistance heating or induction heating

6) Atmosphere medium: Nitrogen, propylene, acetylene, hydrogen

7) Gas control method: Mass flow meter control

8) Furnace type: Square, round, vertical or horizontal structure (non-standard design)

9) Other media: Furnace shell cooling water

Industry Applications

The products have been widely used in melting, heating, quenching, high-temperature sintering, brazing, hot-fitting processing, semiconductor purification and other thermal processing occasions; serving the petroleum and natural gas, thermal power and nuclear power, metal casting, iron and steel metallurgy, automobile, engineering machinery, wind/hydropower generation, railway, aerospace, 3D metal printing, precious metals, cemented carbide, solar thin-film batteries and other industries.